FORMATION OF NANOSIZED FILMS OF SILICIDES ON SURFACE OF DIFFUSION-ALLOYED SILICON WITH CHROMIUM ATOMS
DOI:
https://doi.org/10.61841/xs4vsr79Keywords:
silicide, film, alloying, annealing, quenching, nucleation, cluster.Abstract
Nanofilms of chromium silicides with thickness of 2-3 nm on surface of diffusion-alloyed monocrystalline silicon are obtained. It is shown, formation of intermediate layer with thickness of ~ 30 mcm between film and volume compensated high-ohm region of crystal. The determined activation energy of the silicidal phase formation process is 1.5
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