Influence of Deposition on the Mechanical Property Correlation in Al-O Thin Films with Complex Microstructures by RF Magnetron Sputtering
DOI:
https://doi.org/10.61841/hq588708Keywords:
EDAX, XRD, AFM, FESEM.Abstract
AL-O films were ready on un warmed 4140 steel abstract by RF magnetron sputtering technique.
Post-deposition hardening of AL-O films in vacuum was found to enhance film structure and electrical
characteristics like dense structure, swish surface stress relief and increase electrical resistance appropriate
hardening temperature conjointly reduced loss issue. The coordination between hardening conditions and also the
body of the films (crystalline structure and microstructure) was examined by X-ray diffraction (XRD) scanning
electron microscopy (SEM) atomic force microscopy(AFM) and FESEM with EDAX. The mechanical behaviour of
nanocrystalline CNC metals has attracted widespread interest through the bulk of efforts have centred on
economically pure metals.
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